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Wafer stage as an important module of ASMLs lithography machine plays a crucial role in achieving high-acceleration motion and nano-meter performance. To mitigate the stage-induced vibration an effective balance mass system has been commonly used. For the next generation wafer stage new motion characteristics will be introduced meaning the balance mass needs to be redesigned this assignment we are aiming to design a new balance mass system for the new wafer stage and to build a (simplified) dynamical model for analyzing system dynamics behavior. The new modular design would enable better system dynamics for improved performance under a few challenging boundary conditions on volume cost of goods and stability
- investigate existing (mechanical) design & requirements and literature study on state of the art;
- make conceptual design for a new balance mass system and evaluate aspects including but not limited to
manufacturability mechanical behavior and stability costs;
- create models for dynamics analysis and design optimization;
- create detailed designs and mitigate risks/impacts.
- document relevant findings and conclusions.
This is a Master graduation internship for 9 to 12 months (40 hours a week) starting in September 2025.
You:
What we find important is: being proactive curiosity teamwork critical thinking embracing new challenges endurance and goal-oriented
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit hire train and promote persons in all job titles without regard to race color religion sex age national origin veteran status disability sexual orientation or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.
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Required Experience:
Intern
Full-Time