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The Center for Functional Nanomaterials (CFN) at Brookhaven is a DOEfunded national scientific user facility offering users a supported research experience with topcaliber scientists and access to stateofthe art instrumentation. The CFN mission is advancing nanoscience through frontier fundamental research and technique development and is the nexus of a broad collaboration network. Each year CFN staff members support the research of nearly 600 external facility users.
Three strategic nanoscience themes underlie the CFN scientific facilities: The CFN conducts research on nanomaterial synthesis by assembly designing precise architectures with targeted functionality by organizing nanoscale components. The CFN researches and applies platforms for stateoftheart techniques for Accelerated Nanomaterial Discovery integrating synthesis advanced characterization physical modeling and computer science to iteratively explore a wide range of material parameters. The CFN develops and utilizes advanced capabilities for studies of Nanomaterials in Operando Conditions for characterizing materials and reactions at the atomic scale in realworld environments.
The CFN is seeking a talented Postdoctoral Research Associate to conduct research on developing novel hybrid photoresist materials for extreme ultraviolet (EUV) lithography by synthesizing organicinorganic hybrid thin films via atomic layer deposition (ALD) techniques especially vaporphase infiltration (VPI). You will explore the materials chemistry EUV exposure mechanisms highresolution patterning performance and dryetching characteristics of the synthesized hybrid resists by utilizing electron beam lithography (EBL) lowenergy electron exposure infrared (IR) spectroscopy and EUV lithography. This work is part of a larger effort to design photoresist materials for the nextgeneration EUV lithography for Angstromera semiconductor chip manufacturing. You will work under the supervision of Dr. ChangYong Nam (Electronic Nanomaterials Group).
You will synthesize and characterize organicinorganic hybrid thin films applicable to EBL and EUV lithography by leveraging ALD techniques including VPI.
You will perform indepth materials characterization on organicinorganic hybrid resists and measure their EBL & EUV lithography patterning as well as dry etching characteristics as a function of synthesis parameters and materials composition.
You will explore new material compositions EUV exposure mechanisms and EUV photochemistry for improving the performance of vaporsynthesized hybrid EUV photoresists.
You will collaborate with scientific staff with diverse backgrounds including materials science & chemistry nanofabrication and advanced characterizations including those based on synchrotron beamline techniques.
You will disseminate research findings via paper publications and external presentations.
You have a Ph.D. in a relevant discipline (Materials Science Chemical Engineering Chemistry or a related engineering discipline) conferred within the past five years or to be completed prior to the starting date.
You have demonstrated experimental expertise in the synthesis of organicinorganic hybrid thin films using ALD techniques including VPI and their characterization using lowenergy electron microscopy (LEEM)/Xray photoemission electron microscopy (XPEEM) EBL & EUV lithography atomic force microscopy (AFM) Xray photoelectron spectroscopy (XPS) inductivelycoupled plasma reactive ion etching (ICPRIE) and other characterization methods including transmission electron microscopy (TEM).
You have demonstrated experimental experience in nanofabrication processes (e.g. EBL physical vapor deposition ALD etc. and critical dimension (CD) measurements & analysis using scanning electron microscopy (SEM) and CD analysis software.
You communicate effectively verbally and in writing evidenced by peerreviewed publications and conference presentations/proceedings.
You are committed to creative and independent research teamwork and fostering an environment of safe scientific work practices.
You have handson experimental experience with applying VPIbased hybridization using various organic templates including but not limited to selfassembled block copolymer thin films lithographically patterned polymer structures and other exotic templates.
You have experience in performing EUV patterning using shifts for the Micro Exposure Tool 5 (MET5)a 0.55 NA EUV lithography patterning beamlineat Advanced Light Source of the Lawrence Berkeley National Laboraotry.
You have experience in optimizing the patterning performance of hybrid resists by engineering materials chemistry and lithography patterning process parameters.
You have experience or working knowledge of the synthesis of organicinorganic hybrid thin films using molecular layer deposition (MLD).
You have experience in materials characterization and analysis relevant for organicinorganic hybrid thin films including but not limited to ellipsometry Xray scattering Xray reflectivity and IR spectroscopy.
This is a 2year Postdoc Assignment.
BNL policy requires that after obtaining a PhD eligible candidates for research associate appointments may not exceed a combined total of 5 years of relevant work experience as a post doc and/or in an R&D position excluding time associated with family planning military service illness or other lifechanging events.
Brookhaven Laboratory is committed to providing fair equitable and competitive compensation. The full salary range for this position is $71900 $80000 / year. Salary offers will be commensurate with the final candidates qualification education and experience and considered with the internal peer group
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Brookhaven National Laboratory () delivers discovery science and transformative technology to power and secure the nations future. Brookhaven Lab is a multidisciplinary laboratory with seven Nobel Prizewinning discoveries 37 R&D 100 Awards and more than 70 years of pioneering research. The Lab is primarily supported by the U.S. Department of Energys (DOE) Office of Science. Brookhaven Science Associates (BSA) operates and manages the Laboratory for DOE. BSA is a partnership between Battelle and The Research Foundation for the State University of New York on behalf of Stony Brook University. BSA salutes our veterans and active military members with careers that leverage the skills and unique experience they gained while serving our country learn more at BNL Opportunities for Veterans at Brookhaven National Laboratory.
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