ASML US D&E branch focuses on developing modern computational lithography technology that enable our most advanced lithography machines working at their best performance and efficiency. The main tasks include develop computational lithographic simulation flow (mask optics resist and etch) improve accuracy and speed with wide range of conventional and machine learning optimization algorithms.
Ph.D. or M.S. in STEM such as computer science electric engineering physics chemistry applied mathematics or related fields.
Proven work experience in previous research/engineering projects.
3 year experience in C and/or other object-oriented software development.
Python/Matlab programming experience (especially in machine learning) is a plus.
Analytical skills for evaluating information carefully and solving complex problems
Communication skills for technical discussions
Detail-oriented with the ability to catch minor errors which can result in major problems
Math skills including calculus and other advanced mathematics
Experience in the following fields: image processing computational geometry large data application high performance computing
Modeling - physical chemical and material modeling of lasers optics diffusion/reaction and/or lithography systems
Simulation - geometry engines rendering Fourier optics RCWA/FDTD PDE finite difference.
Software Development - C/Python Linux compute farms distributed computing over 10k cores
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Required Experience:
Intern
ASML gives the world's leading chipmakers the power to mass produce patterns on silicon, helping to make computer chips smaller, faster and greener.